Semiconductor substrate processing apparatus including uniformity baffles

摘要: A semiconductor substrate processing apparatus for substrates includes showerhead module delivering process gas through a faceplate having passages therethrough from the source to zone of wherein individual are processed. The comprises delivery conduit in fluid communication with cavity at lower end thereof, baffle arrangement and cavity, blocker plate disposed below arrangement. baffles which divide flowing into center, inner annular, outer annular flow streams. center stream exits above central portion faceplate, an region faceplate.