Compact memory structure including tunneling diode

作者: Paul Berger

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摘要: A resonant inter-band tunnel diode (RITD) can be fabricated using semiconductor processing similar to that used for Complementary Metal-Oxide-Semiconductor (CMOS) device fabrication, such as include silicon. memory cell (e.g., a random access (RAM) cell) one or more negative differential resistance device, tunneling diodes, provide single-bit multi-bit cell. In an example, “hybrid” fabricated, including devices, MOS transistor structure, and capacitor integrated configuration generally-available dynamic RAM (DRAM) but without requiring refresh offering higher area efficiency.

参考文章(43)
Phillip E. Thompson, Paul R. Berger, Roger Lake, Sean L. Rommel, Karl Hobart, Method of making interband tunneling diodes ,(2001)
Herbert Goronkin, Saied N. Tehrani, Xiaodong T. Zhu, Jun Shen, Method of fabricating InAs/GaSb/AlSb material system SRAM ,(1995)
Y.C. Kao, A.C. Seabaugh, H.T. Yuan, Vertical integration of structured resonant tunneling diodes on InP for multi-valued memory applications LEOS 1992 Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, and Smart Pixels. pp. 489- 492 ,(1992) , 10.1109/ICIPRM.1992.235557
T. Baba, Development of quantum functional devices for multiple-valued logic circuits international symposium on multiple valued logic. pp. 2- 9 ,(1999) , 10.1109/ISMVL.1999.779687