作者: Paul Berger
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摘要: A resonant inter-band tunnel diode (RITD) can be fabricated using semiconductor processing similar to that used for Complementary Metal-Oxide-Semiconductor (CMOS) device fabrication, such as include silicon. memory cell (e.g., a random access (RAM) cell) one or more negative differential resistance device, tunneling diodes, provide single-bit multi-bit cell. In an example, “hybrid” fabricated, including devices, MOS transistor structure, and capacitor integrated configuration generally-available dynamic RAM (DRAM) but without requiring refresh offering higher area efficiency.