Preparation and properties of MoSx films grown by d.c. magnetron sputtering
作者： A. Aubert , J.Ph. Nabot , J. Ernoult , Ph. Renaux
DOI: 10.1016/0257-8972(90)90136-Z
关键词:
摘要: … at a speed of 10 mm s~’.These tests revealed … -stoichiometric MoS2 film rises slowly from 0.04 to 0.067 during the first 1 X i0~cycles and then remains stable up to the end. SMM analysis …
elsevier.com
sci-hub.se 参考文章(9)
K. Reichelt, G. Mair, The structure and composition of rf reactively sputtered MoSx films Journal of Applied Physics. ,vol. 49, pp. 1245- 1247 ,(1978) , 10.1063/1.325014
C. Müller, C. Menoud, M. Maillat, H.E. Hintermann, Thick compact MoS2 coatings Surface and Coatings Technology. ,vol. 36, pp. 351- 359 ,(1988) , 10.1016/0257-8972(88)90165-X
T. Spalvins, A review of recent advances in solid film lubrication Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 5, pp. 212- 219 ,(1987) , 10.1116/1.574106
Talivaldis Spalvins, Tribological properties of sputtered MoS2 films in relation to film morphology Thin Solid Films. ,vol. 73, pp. 291- 297 ,(1980) , 10.1016/0040-6090(80)90492-7
T. Ito, K. Nakajima, Non-stoichiometry of MoS2 phase prepared by sputtering Philosophical Magazine B. ,vol. 37, pp. 773- 775 ,(1978) , 10.1080/01418637808225655
Paul D. Fleischauer, Fundamental aspects of the electronic structure, materials properties and lubrication performance of sputtered MoS2 films Thin Solid Films. ,vol. 154, pp. 309- 322 ,(1987) , 10.1016/0040-6090(87)90375-0
H. Hübsch, P. Willich, K. Reichelt, H. Dimigen, Stoichiometry and friction properties of sputtered MoSx layers Thin Solid Films. ,vol. 129, pp. 79- 91 ,(1985) , 10.1016/0040-6090(85)90097-5
R.I Christy, Sputtered MoS2 lubricant coating improvements Thin Solid Films. ,vol. 73, pp. 299- 307 ,(1980) , 10.1016/0040-6090(80)90493-9
R. Bichsel, F. Levy, Morphological and compositional properties of MoSe2 films prepared by r.f. magnetron sputtering Thin Solid Films. ,vol. 116, pp. 367- 372 ,(1984) , 10.1016/0040-6090(84)90117-2