Phase transitions in ferroelectric silicon doped hafnium oxide

作者: T. S. Böscke , St. Teichert , D. Bräuhaus , J. Müller , U. Schröder

DOI: 10.1063/1.3636434

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摘要: We investigated phase transitions in ferroelectric silicon doped hafnium oxide (FE-Si: HfO2) by temperature dependent polarization and x-ray diffraction measurements. If heated under mechanical confinement, the orthorhombic ferroelectric phase reversibly transforms into a phase with antiferroelectric behavior. Without confinement, a transformation into a monoclinic/tetragonal phase mixture is observed during cooling. These results suggest the existence of a common higher symmetry parent phase to the orthorhombic and monoclinic …

参考文章(15)
T. S. Böscke, J. Müller, D. Bräuhaus, U. Schröder, U. Böttger, Ferroelectricity in hafnium oxide thin films Applied Physics Letters. ,vol. 99, pp. 102903- ,(2011) , 10.1063/1.3634052
TS Böscke, PY Hung, PD Kirsch, MA Quevedo-Lopez, R Ramírez-Bon, None, Increasing permittivity in HfZrO thin films by surface manipulation Applied Physics Letters. ,vol. 95, pp. 052904- ,(2009) , 10.1063/1.3195623
Koji Kita, Kentaro Kyuno, Akira Toriumi, Permittivity increase of yttrium-doped HfO2 through structural phase transformation Applied Physics Letters. ,vol. 86, pp. 102906- ,(2005) , 10.1063/1.1880436
Shu-Yau Wu, A new ferroelectric memory device, metal-ferroelectric-semiconductor transistor IEEE Transactions on Electron Devices. ,vol. 21, pp. 499- 504 ,(1974) , 10.1109/T-ED.1974.17955
Erich H. Kisi, C.J. Howard, Crystal Structures of Zirconia Phases and their Inter-Relation Key Engineering Materials. pp. 1- 36 ,(1998) , 10.4028/WWW.SCIENTIFIC.NET/KEM.153-154.1
D. Fischer, A. Kersch, Ab initio study of high permittivity phase stabilization in HfSiO Microelectronic Engineering. ,vol. 84, pp. 2039- 2042 ,(2007) , 10.1016/J.MEE.2007.04.006
N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Kingon, H. Kohlstedt, N. Y. Park, G. B. Stephenson, I. Stolitchnov, A. K. Taganstev, D. V. Taylor, T. Yamada, S. Streiffer, Ferroelectric thin films: Review of materials, properties, and applications Journal of Applied Physics. ,vol. 100, pp. 051606- ,(2006) , 10.1063/1.2336999
Kazuyuki Tomida, Koji Kita, Akira Toriumi, Dielectric constant enhancement due to Si incorporation into HfO2 Applied Physics Letters. ,vol. 89, pp. 142902- ,(2006) , 10.1063/1.2355471
J. R. Anderson, Ferro electric-materials as storage elements for digital computers and switching systems Proceedings of the 1952 ACM national meeting (Toronto) on. pp. 81- ,(1952) , 10.1145/800259.808999
Alexandra Navrotsky, Thermochemical insights into refractory ceramic materials based on oxides with large tetravalent cations Journal of Materials Chemistry. ,vol. 15, pp. 1883- 1890 ,(2005) , 10.1039/B417143H