Light source employing laser-produced plasma
作者： Mark S. Tillack , Yezheng Tao
DOI:
关键词:
摘要: A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the includes one laser source that generates first pulse second in temporal succession, target, where target (or portion target) becomes plasma upon being exposed to pulse. The expand after exposure pulse, expanded is then emission occurs solid piece material, time period between pulses less than 1 microsecond (e.g., 840 ns).
lens.org 参考文章(33)
Oleh Khodykin, Alexander N. Bykanov, Laser produced plasma euv light source with pre-pulse ,(2006)
Paul S. Banks, Andrew C. Forsman, Michael D. Perry, Method and apparatus for increasing the material removal rate in laser machining ,(2002)
Akira Sumitani, Yoshifumi Ueno, Masato Moriya, Tamotsu Abe, Method for cleaning optical element of euv light source device and optical element cleaning device ,(2008)
Mark E. Michaelian, Armando Martos, Jeffrey S. Hartlove, Henry Shields, Samuel Talmadge, Steven W. Fornaca, Laser-produced plasma EUV light source with pre-pulse enhancement ,(2003)
Mark Berrill, Miguel A. Larotonda, Jorge J. Rocca, Yong Wang, Bradley M. Luther, David Alessi, Increased laser output energy and average power at wavelengths below 35 nm ,(2004)
William N. Partlo, Curtis L. Rettig, Norbert R. Bowering, Bjorn A. M. Hansson, Alexander I. Ershov, Daniel J. W. Brown, Joseph J. Macfarlane, Igor V. Fomenkov, LPP EUV light source ,(2005)
William N. Partlo, Curtis L. Rettig, Norbert R. Bowering, Oleh Khodykin, Jerzy R. Hoffman, Rodney D. Simmons, I. Roger Oliver, Stephan T. Melnychuk, R. Mark Johnson, Gerry M. Blumenstock, Timothy S. Dyer, Richard M. Ness, Igor V. Fomenkov, Extreme ultraviolet light source ,(2003)
William N. Partlo, J. Martin Algots, Norbert Bowering, Xiaojiang J. Pan, Gerry M. Blumenstock, Alexander I. Ershov, Igor V. Fomenkov, Collector for euv light source ,(2004)
Shinsuke Fujioka, Hiroaki Nishimura, Katsunobu Nishihara, Akira Sasaki, Atsushi Sunahara, Tomoharu Okuno, Nobuyoshi Ueda, Tsuyoshi Ando, Yezheng Tao, Yoshinori Shimada, Kazuhisa Hashimoto, Michiteru Yamaura, Keisuke Shigemori, Mitsuo Nakai, Keiji Nagai, Takayoshi Norimatsu, Takeshi Nishikawa, Noriaki Miyanaga, Yasukazu Izawa, Kunioki Mima, Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas Physical Review Letters. ,vol. 95, pp. 235004- ,(2005) , 10.1103/PHYSREVLETT.95.235004
S. S. Harilal, M. S. Tillack, Y. Tao, B. O'Shay, R. Paguio, A. Nikroo, Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets. Optics Letters. ,vol. 31, pp. 1549- 1551 ,(2006) , 10.1364/OL.31.001549