A new high‐performance surface‐micromachined tunneling accelerometer fabricated using nanolithography

摘要: We have fabricated a new class of high‐performance tunneling accelerometers using surface micromachining. The accelerometer structures are on the single silicon wafer and consist cantilevered beam with electrostatic deflection electrodes sub‐100‐nm‐diam tip underneath. noise level resolutions in air 100‐ 250‐μm‐long cantilever devices 8.3×10−4 8.5×10−5 g/Hz1/2 at 500 Hz, respectively. operated force rebalance feedback mode low automatic servo‐control circuit, providing dynamic range over 104 g. This technology provides extremely high sensitivity, bandwidth, wide range, an ultracompact, low‐cost package that is easily integrated control electronics.