On the sensitivity of the EBIC technique as applied to defect investigations in silicon

作者: M. Kittler , W. Seifert

DOI: 10.1002/PSSA.2210660220

关键词:

摘要: … diffusion length L, at the defect, the defect contrast should depend on shape and position of the defect, minority carrier diffusion length L outside the defect, dimension and shape of the …

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