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作者: M. Kittler , W. Seifert
DOI: 10.1002/PSSA.2210660220
关键词:
摘要: … diffusion length L, at the defect, the defect contrast should depend on shape and position of the defect, minority carrier diffusion length L outside the defect, dimension and shape of the …
,1989, 引用: 1
,1989, 引用: 0
,1998, 引用: 1
Defect Control in Semiconductors,1990, 引用: 0
,1989, 引用: 14
,1983, 引用: 3
Physica Status Solidi (a),1982, 引用: 22
Vacuum,1988, 引用: 8