EBIC STUDIES OF GETTERING IN SILICON

作者: Martin KITTLER

DOI: 10.1016/B978-0-444-88429-9.50089-6

关键词: Characterization (materials science)Engineering physicsSiliconGetterMaterials scienceForensic engineering

摘要: The paper deals with methodical aspects and applications of the EBIC technique. Among other things, characterization intrinsically gettered silicon is presented treating in particular effects gettering to materials recombination properties.

参考文章(35)
M. Kittler, W. Seifert, On the sensitivity of the EBIC technique as applied to defect investigations in silicon Physica Status Solidi (a). ,vol. 66, pp. 573- 583 ,(1981) , 10.1002/PSSA.2210660220
C. Y. Su, W. E. Spicer, I. Lindau, Photoelectron spectroscopic determination of the structure of (Cs,O) activated GaAs (110) surfaces Journal of Applied Physics. ,vol. 54, pp. 1413- 1422 ,(1983) , 10.1063/1.332166
H. J. Leamy, Charge collection scanning electron microscopy Journal of Applied Physics. ,vol. 53, ,(1982) , 10.1063/1.331667
C. Donolato, Charge collection in a Schottky diode as a mixed boundary-value problem Solid-state Electronics. ,vol. 28, pp. 1143- 1151 ,(1985) , 10.1016/0038-1101(85)90195-9
S. Pizzini, A. Sandrinelli, M. Beghi, D. Narducci, P.L. Fabbri, Recombination effects and impurity segregation at grain boundaries in polycrystalline silicon Revue de Physique Appliquée. ,vol. 22, pp. 631- 636 ,(1987) , 10.1051/RPHYSAP:01987002207063100
K. Graff, H. A. Hefner, W. Hennerici, Monitoring of Internal Gettering during Bipolar Processes Journal of The Electrochemical Society. ,vol. 135, pp. 952- 957 ,(1988) , 10.1149/1.2095846
M. Kittler, W. Seifert, K. Schmalz, K. Tittelbach-Helmrich, Comparison of EBIC and DLTS Measurements on Boron‐Doped CZ Silicon Contaminated with Iron Physica Status Solidi (a). ,vol. 96, ,(1986) , 10.1002/PSSA.2210960247
D.K. Schroder, J.D. Whitfield, C.J. Varker, Recombination lifetime using the pulsed MOS capacitor IEEE Transactions on Electron Devices. ,vol. 31, pp. 462- 467 ,(1984) , 10.1109/T-ED.1984.21551
J. M. Hwang, D. K. Schroder, Recombination properties of oxygen-precipitated silicon Journal of Applied Physics. ,vol. 59, pp. 2476- 2487 ,(1986) , 10.1063/1.336993