A neglected parameter (water contamination) in sputtering of MoS2 films
作者： V. Buck
DOI: 10.1016/0040-6090(86)90334-2
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摘要: Abstract A systematic study of the sources contamination in sputtered molybdenum disulphide films is carried out. The only significant impurity from deposition process found to be water, which present trace amounts. amount this component related parameters coating procedure and can vary over several orders magnitude. Quantitative relations for these effects are derived, conclusions concerning film properties outlined examples confirming model given.
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