Maskless photolithography for using photoreactive agents

摘要: The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects photoreactive chemicals. In an embodiment, the uses micromirror array direct pattern target object. alternate plasma display device generate onto Specifically, provides system method molecular imprinted devices, integrated microsensors fluidic networks substrate, circuits of conducting polymers, substrates photochemical vapor deposition. For applying reagent comprising photopolymer receptors extractable compounds, exposing substrate activate form imprints compounds corresponding incident light. polymer circuit embodiment is conductive polymer. sensor compound fluid channel microsensor arrays deposition, gases deposit chemicals