Catalytic Chemical Sputtering: A Novel Method for Obtaining Large-Grain Polycrystalline Silicon
作者： Hideki Matsumura , Koji Kamesaki , Atsushi Masuda , Akira Izumi
DOI: 10.1143/JJAP.40.L289
关键词:
摘要: A novel method, called the catalytic chemical sputtering is proposed. In this hydrogen atoms generated by cracking reaction between a heated tungsten catalyzer and gas, react with solid silicon to draw out silicon-hydride species from it chemically, such are again decomposed or directly transported form films on substrates. Thus, prepared at low substrate temperatures without using silane disilane gases. By polycrystalline grain size larger than 1 µm obtained of approximately 400°C.
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