High Responsivity ${\rm a\!-\!Si}_{\rm x}{\rm Ge}_{1-{\rm x}}{\rm O}_{\rm y}:{\rm H}$ Microbolometers

作者: Mukti M. Rana , Donald P. Butler

DOI: 10.1109/JSEN.2007.904881

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摘要: Microbolometers of a-Si0.15Ge0.85O.0.236:H were fabricated by radio frequency (RF) magnetron sputtering. A sandwich layer silicon nitride-silicon germanium oxide-silicon nitride was used. Surface micromachining used to fabricate the detectors into a suspended bridge structure. To reduce 1/f-noise, passivated at 250degC in forming gas. high temperature coefficient resistance (TCR) -4.8%/K obtained room temperature. Due observed photo generation below 2.5 mum wavelength, responsivity and detectivity measurements performed with long pass filter placed between infrared light source detectors. The highest 1.05times104 V/W 8.27times106 cm-Hz1/2/W from 40 times pixel. Lowest thermal conductance 4times10-8 while response time 3.44 ms.

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