Growth of Intrinsically Polar Crystalline Textures of Phosphangulene by Organic Molecular Beam Deposition

作者: Julius Tsuwi , Jürg Hulliger

DOI: 10.1021/CG2007217

关键词:

摘要: Under ambient conditions, materials belonging to polar space groups exceed charge compensation of intrinsically charged (hkl) faces. In the high vacuum, however, becomes ineffective so that nucleating or growing crystalline on electrodes may lead unipolar polycrystalline bulk (∞m texture). We present here a new approach grow organic textures by using an molecular beam deposition (OMBD) technique. Results indicate electrostatic polarity substrate influences substantially formation phosphangulene texture. The influence electric field growth crystals points fact aligns developing along field, property optimum for achieving desired self-assembly being crystal texture pyroelectric applications.

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