Mtj mram with stud patterning

摘要: Use of a multilayer etching mask that includes stud and removable spacer sleeve for MTJ to form bottom electrode is wider than the rest pillar described. The first embodiment invention described top mask. In second third embodiments conductive material also serves as electrode. after formed around it initially increase masking width phase etching. removed further etching, create step structures are progressively transferred down into layers forming pillar. one by net polymer deposition during an phase.