作者: Junying Hao , Tao Xu , Junyan Zhang , Weimin Liu
DOI: 10.1088/0022-3727/39/6/021
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摘要: Amorphous hydrogenated carbon nitride (a-CN : H) films were deposited onto silicon (n-100) substrates by dual direct current radio frequency plasma enhanced chemical vapour deposition with CH 4 and N 2 as feedstock at different ratios. The composition surface morphology of the characterized means x-ray photoelectron spectroscopy, Raman spectroscopy atomic force microscopy; while mechanical tribological properties evaluated using nano-indentation UMT test system. It was found that rate decreased significantly but N/C ratio, roughness I D /I G ratio increased /CH flow increased. nano-hardness adhesion strength to substrate sharply first then increasing ratio. Moreover, wear resistance varied structure transformation from an sp 3 -like carbon-nitrogen network in also revealed.