Ion‐implanted Zn diffusion and impurity‐induced disordering of an AlGaAs superlattice

作者: E. P. Zucker , A. Hashimoto , T. Fukunaga , N. Watanabe

DOI: 10.1063/1.100932

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摘要: The diffusion coefficient of ion‐implanted Zn and the Al‐Ga interdiffusion in an Al0.5Ga0.5As/GaAs superlattice (SL) are extracted from secondary‐ion mass spectroscopy profiles for four times at 750 °C. zinc goes as square concentration, implying local thermal equilibrium, is over 200 smaller than reported values gaseous‐source diffusions 650 °C GaAs. SL disordering rate increases with increasing concentration attributed to positively charged column III interstitials (Ga+mI or Al+mI) m between 2 3.

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