High density metal capacitor using via etch stopping layer as field dielectric in dual-damascence interconnect process
作者： Liming Tsau
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摘要: A metal-insulator-metal (MIM) capacitor is made according to a copper dual-damascene process. first or alloy metal layer if formed on substrate. portion of the utilized as lower plate MIM capacitor. An etch stop dielectric used during etching subsequent layers. an not removed and insulator for second later upper
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