Size-filtered multimetal structures

摘要: A size-filtered metal interconnect structure allows formation of structures having different compositions. Trenches widths are formed in a dielectric material layer. blocking layer is conformally deposited to completely fill trenches width less than threshold width. An isotropic etch performed remove the wide trenches, i.e., greater width, while narrow remain plugged with remaining portions The filled and planarized first form critical removed cavities, which second