Plasmonic ‘top-hat’ nano-star arrays by electron beam lithography
作者： Shaoli Zhu , Han-Hao Cheng , Idriss Blakey , Nicholas Stokes , Kostya Ken Ostrikov
DOI: 10.1016/J.MEE.2015.04.084
关键词:
摘要: Lithography techniques play an important role in the fabrication of nanoscale functional devices. In electron beam lithography (EBL) optimum dose irradiation is a critical parameter. this paper, we first identify suitable EBL parameters by writing patterns with different sizes, periods and radiation doses. After finding parameters, show how five-pointed gold nanostructures electric field-enhancing 'top hats' can be fabricated using EBL. Reflectance data these arrays measured order to assess their potential applications biosensing arrays.
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elsevier.com参考文章(15)
Khalil Arshak, Miroslav Mihov, Declan McDonagh, David Sutton, Arous Arshak, Novel dry-developed focused ion beam lithography scheme for nanostructure applications Microelectronic Engineering. ,vol. 73, pp. 144- 151 ,(2004) , 10.1016/J.MEE.2004.02.031
S. Thoms, D.S. Macintyre, M. McCarthy, Sub-35 nm metal gratings fabricated using PMMA with high contrast developers Microelectronic Engineering. ,vol. 41, pp. 207- 210 ,(1998) , 10.1016/S0167-9317(98)00047-1
Wolfram Langheinrich, Heinz Beneking, Nanostructure fabrication by electron beam lithography on insulating substrates using a novel four-layer resist Microelectronic Engineering. ,vol. 13, pp. 225- 228 ,(1991) , 10.1016/0167-9317(91)90083-P
Daniel Dregely, Frank Neubrech, Huigao Duan, Ralf Vogelgesang, Harald Giessen, Vibrational near-field mapping of planar and buried three-dimensional plasmonic nanostructures. Nature Communications. ,vol. 4, pp. 2237- 2237 ,(2013) , 10.1038/NCOMMS3237
Huigao Duan, Richard G. Hobbs, Eric A. Stach, Karl K. Berggren, Vitor R. Manfrinato, Lihua Zhang, Dong Su, Resolution Limits of Electron-Beam Lithography toward the Atomic Scale Nano Letters. ,vol. 13, pp. 1555- 1558 ,(2013) , 10.1021/NL304715P
Hendrix Demers, Nicolas Poirier-Demers, Alexandre Réal Couture, Dany Joly, Marc Guilmain, Niels de Jonge, Dominique Drouin, Three-Dimensional Electron Microscopy Simulation with the CASINO Monte Carlo Software Scanning. ,vol. 33, pp. 135- 146 ,(2011) , 10.1002/SCA.20262
Huigao Duan, Hailong Hu, Hui Kim Hui, Zexiang Shen, Joel KW Yang, None, Free-standing sub-10 nm nanostencils for the definition of gaps in plasmonic antennas Nanotechnology. ,vol. 24, pp. 185301- ,(2013) , 10.1088/0957-4484/24/18/185301
Martin Peckerar, Robert Bass, Kee Woo Rhee, Sub-0.1 μ electron-beam lithography for nanostructure development Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 18, pp. 3143- 3149 ,(2000) , 10.1116/1.1321278
Zhiqiang Zhang, Huigao Duan, Yihui Wu, Wuping Zhou, Cong Liu, Yuguo Tang, Haiwen Li, Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification Microelectronic Engineering. ,vol. 128, pp. 59- 65 ,(2014) , 10.1016/J.MEE.2014.05.027
V. G. Kravets, G. Zoriniants, C. P. Burrows, F. Schedin, A. K. Geim, W. L. Barnes, A. N. Grigorenko, Composite au nanostructures for fluorescence studies in visible light. Nano Letters. ,vol. 10, pp. 874- 879 ,(2010) , 10.1021/NL903498H