作者: Harish C. Barshilia , N. Selvakumar , K. S. Rajam , A. Biswas
DOI: 10.1063/1.2831364
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摘要: Spectrally selective CrxOy∕Cr∕Cr2O3 multilayer absorber coatings were deposited on copper (Cu) substrates using a pulsed sputtering system. The Cr targets sputtered asymmetric bipolar-pulsed dc generators in Ar+O2 and Ar plasmas to deposit CrxOy (bottomlayer)∕Cr∕Cr2O3 (top layer) coating. compositions thicknesses of the individual component layers have been optimized achieve high absorptance (0.899–0.912) low emittance (0.05–0.06). x-ray diffraction data thin film mode showed that coating consists an amorphous phase; Raman coating, however, presence A1g Eg modes, characteristic Cr2O3. photoelectron spectroscopy (XPS) from near-surface region suggested chemical state was form Cr3+ no phases CrO2 CrO3 present. experimental spectroscopic ellipsometric fitted with theoretical models derive dispersion optical const...