Double chamber ion implantation system

作者: Michael C. Vella

DOI:

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摘要: An improved double chamber ion source comprising a plasma generating chamber, charge exchange and divider structure therebetween. The includes magnetic shielding material to reduce exposure of interior components field lines externally generated. compartment further comprises inclusion heat shield and/or cooling system overcome deleterious effects caused by increased temperature in the chamber. has plurality apertures having configuration surface area on

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