Ion source of an ion implanter

摘要: An ion source uses at least one induction coil to generate ac magnetic field couple rf/VHF power into a plasma within vessel, where the excitation may be single set of turns each turn having lobes or multiple separate sets windings. The is positioned outside and proximate that side vessel opposite extraction slit, elongated parallel length dimension slit. conducting shield(s) integrated with well are used block capacitive coupling and/or collect any current coupled plasma. shield between can either from coils, tuned have higher voltage ignite clean source.