Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process
作者： Shingo Ichimura , Hidehiko Nonaka , Yoshiki Morikawa , Tsuyoshi Noyori , Tetsuya Nishiguchi
DOI: 10.1116/1.1705592
关键词:
摘要: A system is described which can continuously generate/supply highly concentrated (HC) ozone gas to satisfy the future need for practical low-temperature oxidation. This comprises four vessels, each with independent temperature control. The supply a constant flow of HC by allocating one modes operation, i.e., accumulation/storage, vaporization (supply), evacuation, and cooling, vessels so that all be simultaneously addressed. maximum rate 60 sccm flux stability ±1.1%, an concentration over 99.5 vol % achieved at outlet. was applied formation ultrathin SiO2 film on 4 in. diameter silicon wafer substrate.
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S. Ichimura, S. Hosokawa, H. Nonaka, K. Arai, Evaluation of new ozone generator designed for oxide film formation by molecular beam epitaxy method Journal of Vacuum Science and Technology. ,vol. 9, pp. 2369- 2373 ,(1991) , 10.1116/1.577278
Akira Kurokawa, Ken Nakamura, Shingo Ichimura, Dae Won Moon, Reduction of the interfacial Si displacement of ultrathin SiO2 on Si(100) formed by atmospheric-pressure ozone Applied Physics Letters. ,vol. 76, pp. 493- 495 ,(2000) , 10.1063/1.125798
K. Nakamura, S. Ichimura, A. Kurokawa, K. Koike, G. Inoue, T. Fukuda, Ultrathin silicon oxide film on Si(100) fabricated by highly concentrated ozone at atmospheric pressure Journal of Vacuum Science and Technology. ,vol. 17, pp. 1275- 1279 ,(1999) , 10.1116/1.581808
Stuart Anderson, Konrad Mauersberger, Calibration of a mass spectrometer experiment for ozone Review of Scientific Instruments. ,vol. 52, pp. 1025- 1028 ,(1981) , 10.1063/1.1136728
S Ichimura, A Kurokawa, K Nakamura, H Itoh, H Nonaka, K Koike, Ultrathin SiO2 film growth on Si by highly concentrated ozone Thin Solid Films. ,vol. 377-378, pp. 518- 524 ,(2000) , 10.1016/S0040-6090(00)01376-6
Tetsuya Nishiguchi, Hidehiko Nonaka, Shingo Ichimura, Yoshiki Morikawa, Mitsuru Kekura, Masaharu Miyamoto, High-quality SiO2 film formation by highly concentrated ozone gas at below 600°C Applied Physics Letters. ,vol. 81, pp. 2190- 2192 ,(2002) , 10.1063/1.1507829
Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Masaharu Miyamoto, Hidehiko Nonaka, Shingo Ichimura, Reactive oxygen beam generation system using pulsed laser evaporation of highly concentrated solid ozone Review of Scientific Instruments. ,vol. 73, pp. 1217- 1223 ,(2002) , 10.1063/1.1448909
Angelo Bongiorno, Alfredo Pasquarello, Mark S. Hybertsen, L. C. Feldman, Transition structure at the Si(100)-SiO2 interface Physical Review Letters. ,vol. 90, pp. 186101- ,(2003) , 10.1103/PHYSREVLETT.90.186101
Shunsuke Hosokawa, Shingo Ichimura, Ozone jet generator as an oxidizing reagent source for preparation of superconducting oxide thin film Review of Scientific Instruments. ,vol. 62, pp. 1614- 1619 ,(1991) , 10.1063/1.1142440
Fumikazu Imai, Kimio Kunimori, Hisakazu Nozoye, Performance characteristics of an oxygen radical beam radio‐frequency source Journal of Vacuum Science and Technology. ,vol. 13, pp. 2508- 2512 ,(1995) , 10.1116/1.579495