Method and apparatus for achieving multiple patterning technology compliant design layout

摘要: A method and apparatus for achieving multiple patterning compliant technology design layouts is provided. An exemplary includes providing a routing grid having tracks; designating each of the tracks one at least two colors; applying pattern layout plurality features to grid, wherein corresponds with track; feature splitting constraint determine whether layout. If not layout, may be modified until achieved. coloring based on color feature's corresponding track, thereby forming colored generating masks Each mask single color.