Semiconductor optical integrated device and method for fabricating the same
作者： Ayahito Uetake , Shuichi Tomabechi , Shigekazu Okumura , Mitsuru Ekawa
DOI:
关键词:
摘要: A semiconductor optical integrated device includes a first formed over (001) plane of substrate and second which is the in (110) orientation from optically connected to device. The core layer clad has crystal surface on side that forms an angle θ greater than or equal 55 degrees less 90 with plane.
lens.org 参考文章(29)
Koichiro Adachi, Yasunobu Matsuoka, Shinji Tsuji, Toshiki Sugawara, Kazunori Shinoda, Horizontal cavity surface emitting laser diodes, vertical illuminated photodiodes, and methods of their fabrication ,(2012)
Masashige Ishizaka, Optical waveguide and method for fabricating the same ,(2008)
Arne Leinse, Rene Gerrit Heideman, Surface waveguide having a tapered region and method of forming ,(2013)
Takanori Yamamoto, Optical waveguide and method of manufacturing the same, and optical waveguide mounted board ,(2010)
Kishio Yokouchi, Alexei Glebov, Flexible optical waveguides for backplane optical interconnections ,(2005)
Tomoaki Kato, Semiconductor element and method for manufacturing semiconductor element ,(2006)
Kenji Yanagisawa, Kazunao Yamamoto, Takanori Yamamoto, Hideki Yonekura, Optical waveguide having an optical transmission direction changing part ,(2009)
Hideki Ono, Optical waveguide element and method for manufacturing optical waveguide element ,(2000)
Tetsuya Mori, Kimio Moriya, Optical waveguide and electronic device ,(2011)
Hirotaka Kizuki, Tohru Takiguchi, Katsuhiko Goto, Semiconductor optical devices ,(1994)