Additive processing electroless metal plating using aqueous photoresist
作者： Theodore F. Schaaf , Bruce S. Madsen , James T. Huneke , II John K. Dorey
DOI:
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摘要: In a method for making printed circuit board employing an aqueous type photoresist and including etching of the substrate surface with chromic acid after application mask, chromium is washed from reducing agent at pH ≦10.
google.nl 参考文章(5)
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