Barometric pressure air micro-plasma jet device for etching thin polymer film without mask

摘要: The invention provides a barometric pressure air micro-plasma jet device for an etching thin polymer film without mask. comprises insulating column, high-voltage electrode, micro-needle, grounding low-frequency voltage source and sample. end of the is connected with low-voltage electrode are in common ground mode. column externally micro-needle electrode. arranged on outer wall micro-needle. portion provided nozzle. Plasma line width micrometer scale exists between nozzle Vacuum equipment does not need to be used, mask plate needed, simple structure, convenient operate, low manufacturing cost, capable well imaging form micro-structure, has good application prospects large-scale flexible electron field.