Detachment Lithography of Photosensitive Polymers: A Route to Fabricating Three-Dimensional Structures

摘要: A technique to create arrays of micrometer-sized patterns photosensitive polymers on the surface elastomeric stamps and transfer these planar nonplanar substrates is presented. The are initially patterned through detachment lithography (DL), which utilizes difference in adhesion forces induce mechanical failure film along edges protruded parts mold. polydimethylsiloxane (PDMS) stamp with a kinetically thermally adjustable conformal contact can detached etched or curved substrates, as well ones. These printed remain photochemically active for further modification via photolithography, and/or serve resists subsequent etching deposition, such that photolithography be used highly nonconformal surfaces. Various 3D structures fabricated using process have potential applications MEMS (micro-electromechanical systems) sensors/actuators, optical devices, microfluidics.