Oxidation of Ge(100) and Ge(111) surfaces: an UPS and XPS study
作者： K. Prabhakaran , T. Ogino
DOI: 10.1016/0039-6028(94)00746-2
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摘要: In situ and ex situ oxidation studies are carried out on Ge (100) and Ge (111) employing techniques of ultraviolet and X-ray photoelectron spectroscopy (UPS and XPS). In situ oxidation produces mainly GeO on both the surfaces. Ge 3d and 2p levels show a chemical shift of about 1.4 and 1.8 eV respectively corresponding to this oxide. GeO desorbs from the surface on annealing to 400° C without undergoing any transformation. On exposing to air, a mixture of oxides consisting mainly of GeO and GeO2 are formed on both the surfaces. Ge …
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