Method of forming semiconductor cell structure, method of forming semiconductor device including the semiconductor cell structure, and method of forming semiconductor module including the semiconductor device
作者： Keun-Hee Bai , Chul-Ho Shin , Sang-Kuk Kim , Shin-Hye Kim
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摘要: In a method of forming semiconductor cell structure, first insulating layer may be formed on substrate. A connection pattern in the layer. Second and third layers sequentially pattern. The etched at least twice second once to form through hole layers. expose
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