Calibration as well as measurement on the same workpiece during fabrication

作者: Jiping Li , Jon Madsen , Peter G. Borden

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摘要: Two more measurements are made on the same workpiece, during fabrication. Each measurement may be employing a different process. The used together to determine property of workpiece. For example, multiple from first process with predetermined value interest in simulator generate simulated signal measured second One or such values and identify interest. When workpiece's is found not match specification, control parameter fabrication adjusted, thereby implement control.

参考文章(87)
Harry W. K. Tom, Tao-Yuan Chang, Rubens da S. Miranda, Method for manufacturing a semiconductor device, including optical inspection ,(1992)
Allan Rosencwaig, Process Control in IC Manufacturing with Thermal Waves Springer US. pp. 2031- 2037 ,(1990) , 10.1007/978-1-4684-5772-8_261
C. G. Welles, A. Bivas, W. Lee Smith, Allan Rosencwaig, High-Resolution Thermal Wave Imaging of Surface and Subsurface Defects in IC Metal Lines Springer, Boston, MA. pp. 1187- 1191 ,(1991) , 10.1007/978-1-4615-3742-7_7
J. Opsal, High Resolution Thermal Wave Measurements and Imaging of Defects and Damage in Electronic Materials International topical meeting on photoacoustic and photothermal phenomena II. 6. ,vol. 62, pp. 140- 145 ,(1990) , 10.1007/978-3-540-46972-8_34