Inspection guided overlay metrology
作者： Allen Park , Amir Widmann , Ellis Chang
DOI:
关键词:
摘要: Inspection guided overlay metrology may include performing a pattern search in order to identify predetermined on semiconductor wafer, generating care area for all instances of the identifying defects within generated areas by an inspection scan each areas, wherein includes low-threshold or high sensitivity scan, sites wafer having measured error larger than selected specification utilizing defect technique, comparing location data identified one more locations are proximate sites, and sampling plan based locations.
google.de 参考文章(15)
S. M. Reza Sadjadi, Method of aligning a reticle for formation of semiconductor devices ,(2005)
Younus Vora, Andrew Hill, Harish Hiriyannaiah, Ping Ding, Verlyn Fischer, Chris Maher, Computer-implemented methods, computer-readable media, and systems for identifying one or more optical modes of an inspection system as candidates for use in inspection of a layer of a wafer ,(2008)
Alexander T. Schwarm, Arulkumar P. Shanmugasundram, Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing ,(2002)
Allen Park, Ellis Chang, Computer-implemented methods, carrier media, and systems for generating a metrology sampling plan ,(2007)
Jiping Li, Jon Madsen, Peter G. Borden, Calibration as well as measurement on the same workpiece during fabrication ,(2001)
Matthew A. Purdy, Method and system for dynamically adjusting metrology sampling based upon available metrology capacity ,(2004)
Mark Ghinovker, Boris Golovanevsky, Moshe Preil, Pavel Izikson, Elyakim Kassel, Jorge Poplawski, Chris A. Mack, John C. Robinson, Michael Adel, Overlay metrology and control method ,(2003)
Gary Bultman, John Fielden, Dan Wack, Kyle A. Brown, Mehrdad Nikoonahad, Ady Levy, Methods and systems for determining a presence of macro defects and overlay of a specimen ,(2001)
Allen Park, Peter Rose, Ellis Chang, Sagar Kekare, Khurram Zafar, Methods and systems for utilizing design data in combination with inspection data ,(2006)
Kris Bhaskar, Brian Duffy, Lalita A. Balasubramanian, Chetana Bhaskar, Santosh Bhattacharyya, Mohan Mahadevan, Chris Maher, Alpa Kohli, Aneesh Khullar, Ashok Kulkarni, Eliezer Rosengaus, Cecelia Campochiaro, Systems and methods for creating persistent data for a wafer and for using persistent data for inspection-related functions ,(2008)