Detecting and preventing instabilities in plasma processes
作者： Victor Brouk , Jeff Roberg , Daniel Carter
DOI:
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摘要: Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to plasma with amplifier; determining whether low frequency instability oscillations present or high the plasma; altering, based upon present, an impedance of load that is experienced by amplifier, amplifier including at least plasma.
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