Method and apparatus for cutting a semiconductor wafer

作者: Mitsutoshi Oaza Kurita Higashi , Hideaki Oaza Kurita Sakaguchi

DOI:

关键词:

摘要: A method for cutting a semiconductor wafer is provided. mount tape adhered to back surface of the wafer. The comprises resin base and mesh-like member made material harder than that embedded in base. beam-like liquid jet ejected toward front and, simultaneously, laser beam transmitted axially through said jet, so cut into individual pieces, by beam, together with tape, while not cut, but remains its connected state.

参考文章(9)
Mitsuru Nukui, Toyotaka Wada, Shirou Murai, Kenichiro Nishi, Tomio Nakagawa, Kazuo Nakajima, Tetsuo Okuyama, Ingot slicing method, an ingot manufacturing method and a sliced ingot grinding apparatus ,(1999)
James A. Ariglio, Harry Menegus, Method and apparatus for breaking brittle materials ,(1996)
Alessio Muzzi, Claudio Cipriani, Dario Gusti, Method and device for cutting hollow glass articles by a laser beam ,(1996)
Katsuyuki Imoto, Shinobu Sato, Method and apparatus for dicing a substrate ,(1996)
Ann Issaris, Yoshiaki Mitsuoka, Yuuzou Akada, Walter Dr. Eevers, Water-permeable adhesive tape for semiconductor processing ,(2000)
Kiyoshi Inoue, Laser machining apparatus ,(1983)