作者: M.-C. Jung , H. J. Shin , K. Kim , J. S. Noh , J. Chung
DOI: 10.1063/1.2236216
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摘要: Amorphous Ge2Sb2Te5 (a-GST) film, 100nm thick, was grown by cosputtering from GeTe and Sb2Te3 targets on a silicon wafer at room temperature. The native oxidized layer, which formed in air about 20nm thick measured secondary ion mass spectroscopy, removed Ne+ sputtering for 1h with 0.6kV beam energy. Core-level spectra of the Te 3d 4d, Sb Ge oxygen-free a-GST were obtained high-resolution x-ray photoelectron spectroscopy synchrotron radiation compared those GeTe. analysis implies that is composed base chemical states