Formation of the Co/Si(110) interface: Phase composition and magnetic properties
作者： M. V. Gomoyunova , G. S. Grebenyuk , K. M. Popov , I. I. Pronin
DOI: 10.1134/S1063784213060145
关键词:
摘要: The formation of the Co/Si(110)16 × 2 interface and its magnetic properties are studied by high-energy-resolution photoelectron spectroscopy using synchrotron radiation linear dichroism in photoemission core electrons. It is shown that a cobalt coating less than 7 A thick deposited on silicon surface at room temperature results an ultrathin (1.7 A) interfacial silicide layer silicon-cobalt solid solution. ferromagnetic ordering observed evaporation dose corresponding to 6–7 which case metal film begins grow solution layer. During 300°C-annealing sample covered nanometer-thick layer, gradually disappears four phases arise: metastable Co3Si three stable nonmagnetic silicides (Co2Si, CoSi, CoSi2).
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