作者: O Stryckmans , T Segato , P.H Duvigneaud
DOI: 10.1016/0040-6090(95)08154-2
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摘要: Abstract Chemical vapor deposition (CVD) from an aerosol generated by ultrasonic atomization was used to grow magnesium oxide films on alumina polycrystalline substrates. The precursor a solution of acetylacetonate (Mg(acac) 2 ) in isopropanol. decomposition the salt studied determine CVD temperature range. Thermal analysis thermogravimetry, differential scanning calorimetry and IR mass spectrometry enabled model be determined. Above melting at 265°C, Mg(acac) is no longer stable. molecule splits giving, one hand, gaseous organic residue and, other, liquid (MgC 5 H 6 O which turn gives rise MgO 450°C. film presents smooth microstructure highly preferentially oriented structure with (200) planes parallel substrate surface about 400°C. thickness obtained reaches 10 μm, represents effective diffusion barrier for thick containing alkaline earth elements.