Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives

摘要: Orientation control of thin film nanostructures derived from block copolymers (BCPs) are great interest for various emerging technologies like separation membranes, nanopatterning, and energy storage. While many BCP compositions have been developed these applications, perpendicular orientation domains is still very challenging to achieve. Herein we report on a new, integration-friendly approach in which small amounts phase-preferential, surface active polymer (SAP) was used as an additive polycarbonate-containing formulation obtain perpendicularly oriented with 19 nm natural periodicity upon thermal annealing. In this work, the vertically were demonstrate next generation patterning applications advanced semiconductor nodes. Furthermore, pattern transfer into hardmask layer via commonly etch techniques graphoepitaxy-based directed self-assembly using existing lithographic integrat...