Thermal stability of thin‐film amorphous W‐Ru, W‐Re, and Ta‐Ir alloys

作者: A. W. Denier van der Gon , J. C. Barbour , R. de Reus , F. W. Saris

DOI: 10.1063/1.338171

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摘要: The crystallization behavior of self‐supporting thin‐film amorphous W‐Ru, W‐Re, and Ta‐Ir alloys has been studied with transmission electron microscopy. Crystallization temperatures have observed which are much lower than the predicted by a semiempirical model: highest 775 °C for W‐Ru W‐Re alloys, 900 °C alloys. All three systems show maximum thermal stability at composition expected using enthalpy considerations.

参考文章(7)
K.H.J. Buschow, N.M. Beekmans, Thermal stability of amorphous alloys Solid State Communications. ,vol. 35, pp. 233- 236 ,(1980) , 10.1016/0038-1098(80)90487-1
C. G. Wilson, Order in binary σ-phases Acta Crystallographica. ,vol. 16, pp. 724- 730 ,(1963) , 10.1107/S0365110X63001900
P. T. Moseley, C. J. Seabrook, The crystal structure of β‐tantalum Acta Crystallographica Section B Structural Crystallography and Crystal Chemistry. ,vol. 29, pp. 1170- 1171 ,(1973) , 10.1107/S0567740873004140
M. Nastasi, F. W. Saris, L. S. Hung, J. W. Mayer, Stability of amorphous Cu/Ta and Cu/W alloys Journal of Applied Physics. ,vol. 58, pp. 3052- 3058 ,(1985) , 10.1063/1.335855
M. M. Collver, R. H. Hammond, Stability of amorphous transition‐metal films Journal of Applied Physics. ,vol. 49, pp. 2420- 2422 ,(1978) , 10.1063/1.325083
C. Suryanarayana, Rapidly Quenched Metals Springer US. ,(1980) , 10.1007/978-1-4684-9134-0