Pyrosol deposition of ZnO and SnO2 based thin films: the interplay between solution chemistry, growth rate and film morphology

作者: A Smith

DOI: 10.1016/S0040-6090(00)01403-6

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摘要: Abstract Pyrosol is a chemical vapor deposition (CVD) type process where the precursor of material to be deposited dissolved in an appropriate solvent. An aerosol solution, produced through piezoelectric transducer, transported at atmospheric pressure towards heated substrate pyrolysis and film occur. The purpose present paper discuss using two materials, namely zinc oxide tin oxide, interplay between solution chemistry, growth rate surface morphology. In order obtain high rates, it preferable have small neutral complex molecules solution. With respect morphology, depending on precursor, either equilibrium or non-equilibrium faces can develop. Moreover, when polar surfactant such as HCl region, crystal stabilized during growth.

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