Excitation photocapacitance study of EL2 in n-GaAs prepared by annealing under different arsenic vapor pressures

作者: Yutaka Oyama , Jun-ichi Nishizawa

DOI: 10.1063/1.1839635

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摘要: The excitation photocapacitance method was applied to n-GaAs:Te (n=4×1016cm−3) prepared by annealing under various excess arsenic vapor pressures. By changing the primary photon energies, emission spectra for EL20→EL2+ and EL2+→EL2++ transitions were determined. Considering electron capture processes of valence band (VB)→EL2+ (0.67eV) VB→EL2++ (0.47eV) at 77K, Frank–Condon shifts (dFC) annealed GaAs crystals determined EL2+ level on basis configuration coordinate model. It shown that lattice relaxation around EL2 is larger arsenic-poor conditions, thus it considered vacancies are closely related with atomic defect, in combination defects.

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