Thermodynamics and kinetics of room-temperature microstructural evolution in copper films

作者: C. Detavernier , S. Rossnagel , C. Noyan , S. Guha , C. Cabral

DOI: 10.1063/1.1596366

关键词:

摘要: We studied the energetics and kinetics of microstructural evolution in copper films by estimating magnitude various possible driving forces for change that can be present as-deposited film. A force at least 100 J/cm3 is required to account speed which grain boundaries move room temperature. This value cannot accounted only considering minimization grain-boundary energy effects related surface strain as main mechanisms. It suggested additional needed explain grains recrystallize, originating from a high density defects within grains.

参考文章(35)
Anthony D Rollett, Gregory S Rohrer, F John Humphreys, Recrystallization and Related Annealing Phenomena ,(1996)
S. M. Rossnagel, T. S. Kuan, Time development of microstructure and resistivity for very thin Cu films Journal of Vacuum Science and Technology. ,vol. 20, pp. 1911- 1915 ,(2002) , 10.1116/1.1507340
Harry A. Atwater, Carl V. Thompson, Henry I. Smith, Ion‐bombardment‐enhanced grain growth in germanium, silicon, and gold thin films Journal of Applied Physics. ,vol. 64, pp. 2337- 2353 ,(1988) , 10.1063/1.341665
J.E. Sanchez, E. Arzt, Effects of grain orientation on hillock formation and grain growth in aluminum films on silicon substrates Scripta Metallurgica et Materialia. ,vol. 27, pp. 285- 290 ,(1992) , 10.1016/0956-716X(92)90513-E
S.-L. Zhang, F.M. d'Heurle, Kinetic studies of intermetallic compound formation by resistance measurements Thin Solid Films. ,vol. 256, pp. 155- 164 ,(1995) , 10.1016/0040-6090(94)06288-9
C. Detavernier, D. Deduytsche, R. L. Van Meirhaeghe, J. De Baerdemaeker, C. Dauwe, Room-temperature grain growth in sputter-deposited Cu films Applied Physics Letters. ,vol. 82, pp. 1863- 1865 ,(2003) , 10.1063/1.1563048
M. Hillert, Inhibition of grain growth by second-phase particles Acta Metallurgica. ,vol. 36, pp. 3177- 3181 ,(1988) , 10.1016/0001-6160(88)90053-3
S Lagrange, S.H Brongersma, M Judelewicz, A Saerens, I Vervoort, E Richard, R Palmans, K Maex, Self-annealing characterization of electroplated copper films Microelectronic Engineering. ,vol. 50, pp. 449- 457 ,(1999) , 10.1016/S0167-9317(99)00314-7
C. Lingk, M. E. Gross, RECRYSTALLIZATION KINETICS OF ELECTROPLATED CU IN DAMASCENE TRENCHES AT ROOM TEMPERATURE Journal of Applied Physics. ,vol. 84, pp. 5547- 5553 ,(1998) , 10.1063/1.368856
John A. Thornton, Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings Journal of Vacuum Science and Technology. ,vol. 12, pp. 830- 835 ,(1975) , 10.1116/1.568682