Growth of crystalline SiC films by triode plasma CVD using an organosilicon compound
作者： Kanji Yasui , Masahide Kimura , Tadashi Akahane
DOI: 10.1002/(SICI)1520-6432(199902)82:2<55::AID-ECJB7>3.0.CO;2-Z
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sci-hub.se 参考文章(14)
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