作者: Arnaud Le Febvrier , Jens Jensen , Per Eklund
DOI: 10.1116/1.4975595
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摘要: The effect of the wet-cleaning process using solvents and detergent on surface chemistry MgO(001) substrate for film deposition was investigated. Six different processes solvent were compared. growth studied by example system ScN. cleaned x-ray photoelectron spectroscopy film/substrate interface after investigated time-of-flight secondary ion mass spectroscopy. composition is dependent process. Sonication in a before yield pure oxide compared to hydroxide/carbonate contaminated all other processes. An annealing step efficient removal carbon contamination as well most hydroxide or carbonates. study revealed that significantly affects final quality. with followed cleaning exhibited cleanest annealing, addition sharpest interface.The de...