Low temperature growth and characterization of (Na,K)NbOx thin films
作者： Veronika M Kugler , Fredrik Söderlind , Denis Music , Ulf Helmersson , Johanna Andreasson
DOI: 10.1016/S0022-0248(03)01184-9
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摘要: Thin (Na,K)NbOx perovskite films (NKN) have been deposited on SiO2/Si(0 0 1) substrates at low temperatures, from 350°C to 550°C, by RF magnetron sputtering. The effects of substrate temperature microstructure, electrical-, and mechanical properties the NKN studied. X-ray diffraction analysis revealed that temperatures in range 450–550°C were crystalline, growing as a single phase, with preferred orientation (0 0 1). Films 350°C, shown be amorphous. growth had strong influence electrical relative dielectric constants obtained between 38 78. Variations observed for different temperatures: elastic moduli hardness values ranged 205±26 93±29 GPa, 12±2 around 2 GPa, 550°C 450°C, respectively.
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