作者: Choong-Rae Cho , Alex Grishin
DOI: 10.1063/1.124344
关键词: Pulsed laser deposition 、 Substrate (electronics) 、 Thin film 、 Materials science 、 Permittivity 、 Ceramic 、 Ferroelectricity 、 Optoelectronics 、 Texture (crystalline) 、 Dissipation factor
摘要: Highly [100]-axis oriented single-phase Na 0.5 K 0.5 NbO 3 (NKN) thin films have been grown on polycrystalline Pt 80 Ir 20 (Pt) and SiO 2 (native oxide)/Si (111) substrates using KrF …