作者: C. Zaldo , D. S. Gill , R. W. Eason , J. Mendiola , P. J. Chandler
DOI: 10.1063/1.112280
关键词: Fabrication 、 Analytical chemistry 、 Thin film 、 Pulsed laser deposition 、 Epitaxy 、 Photorefractive effect 、 Waveguide (optics) 、 Materials science 、 Ion beam 、 Diffusion (business) 、 Optoelectronics
摘要: KNbO3 crystals have numerous uses in electro-optical, nonlinear optical, and photorefractive device applications. However, their widespread availability is somewhat limited due to cost growth difficulties. For applications requiring waveguide geometries, further problems exist, as not particularly suited general fabrication techniques such diffusion or ion exchange. Ion beam implantation has produced optical waveguides, liquid phase epitaxy prove successful, but so far, the technique of Pulsed Laser Deposition (PLD) been applied thin film growth. We report here results using this technique.