作者: R.M. Tromp , M.C. Reuter
DOI: 10.1016/0304-3991(91)90141-R
关键词:
摘要: Abstract We have designed a new photo-emission/low-energy electron microscope (PEEM/LEEM) for surface studies in ultra-high vacuum (UHV). While following the general design concepts developed by Bauer and Telieps, significant innovations are made to enhance resolution capabilities of instrument: piezoelectrically driven sample stage, magnetic cathode objective lens, an in-vacuum deflection magnet, double-gap, projector lens. Particular attention was paid integrating electron-optical requirements constraints with stringent requirements. At time writing this paper, construction is nearly completed.