The properties of a‐C:H films deposited by plasma decomposition of C2H2

摘要: Diamondlike a‐C:H films have been deposited by plasma decomposition of C2 H2. 50 samples were prepared with a systematic variation the deposition parameters: substrate bias voltage was between −100 and −1400 V H2 gas pressure 4×10−4 2.6×10−1 mbar. The following properties measured: density Rutherford backscattering, total concentration hydrogen elastic recoil detection, bonding ratio sp3 /sp2 infrared spectroscopy, internal stress bending beam method, hardness Knoop microhardness tester. It has shown that other mechanical cannot be correlated to average carbon coordination number mc. This is because mc calculated under assumption homogenous single‐phase model, which does not seem justified. demonstrated can explained application void model.