作者: Fengtao Wang , Fuhan Liu , Ali Adibi
DOI: 10.1364/OE.17.010514
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摘要: We introduce here a simple method of integrating 45 degrees total internal reflection micro-mirrors with polymer optical waveguides by an improved tilted beam photolithography on printed circuit boards to provide surface normal light coupling between and optoelectronic devices for interconnects. De-ionized water is used couple ultraviolet through the waveguide core layer at angle during photo exposure process. This technique compatible PCB manufacturing facility suitable large panel board-level manufacturing. The mirror slope controlled accurately (within +/- 1 degrees) high repeatability. insertion loss uncoated micro-mirror measured be 1.6 dB.